Optimization model for UDWDM-PON deployment based on physical restrictions and asymmetric user's clustering

Germán V. Arévalo, Roberto C. Hincapié, Javier E. Sierra

    Producción científica: Capítulo del libro/informe/acta de congresoPonencia publicada en las memorias del evento con ISBNrevisión exhaustiva

    Resumen

    UDWDM PON is a leading technology oriented to provide ultra-high bandwidth to final users while profiting the physical channels' capability. One of the main drawbacks of UDWDM technique is the fact that the nonlinear effects, like FWM, become stronger due to the close spectral proximity among channels. This work proposes a model for the optimal deployment of this type of networks taking into account the fiber length limitations imposed by physical restrictions related with the fiber's data transmission as well as the users' asymmetric distribution in a provided region. The proposed model employs the data transmission related effects in UDWDM PON as restrictions in the optimization problem and also considers the user's asymmetric clustering and the subdivision of the users region though a Voronoi geometric partition technique. Here it is considered de Voronoi dual graph, it is the Delaunay Triangulation, as the planar graph for resolving the problem related with the minimum weight of the fiber links.

    Idioma originalInglés
    Título de la publicación alojadaOptical Systems Design 2015
    Subtítulo de la publicación alojadaOptical Design and Engineering VI
    EditoresLaurent Mazuray, Andrew P. Wood, Rolf Wartmann
    EditorialSPIE
    ISBN (versión digital)9781628418156
    DOI
    EstadoPublicada - 2015
    EventoOptical Systems Design 2015: Optical Design and Engineering VI - Jena, Alemania
    Duración: 7 sep. 201510 sep. 2015

    Serie de la publicación

    NombreProceedings of SPIE - The International Society for Optical Engineering
    Volumen9626
    ISSN (versión impresa)0277-786X
    ISSN (versión digital)1996-756X

    Conferencia

    ConferenciaOptical Systems Design 2015: Optical Design and Engineering VI
    País/TerritorioAlemania
    CiudadJena
    Período7/09/1510/09/15

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